AI 中文总结
该研究开发了一种位点选择性制备流程，利用原子力显微镜引导制备，实现了液氮温度下40 fT·Hz^(-1/2)的低噪声HTS SQUIDs，解决了晶界局部变异性问题，为规模化制造高均匀性器件提供了途径。
AI 中文摘要
可重复的双晶高温超导量子干涉器件（HTS SQUIDs）仍受构成约瑟夫森结的晶界局部变异性限制。本文开发了一种位点选择性制备流程：在光刻前，原子力显微镜（AFM）绘制目标结区，量化表观晶界宽度，剔除富孔段，并写入邻近定位标记以实现位点特定图案对准。表观晶界宽度作为实用形貌度量，较窄区域始终产生更大临界电流和特征电压。该流程内的迭代优化进一步提升了结与器件性能，达到液氮温度下40 fT·Hz^(-1/2)的场噪声水平。该策略将局部晶界异质性从不可控变异性来源转化为位点选择性制备的基础，为规模化制造高均匀性低噪声HTS SQUIDs提供了途径。
英文摘要
Reproducible bicrystal high-temperature superconducting quantum interference devices remain limited by local variability along the grain boundaries that form the Josephson junctions. Here, we develop a site-selective fabrication workflow in which atomic force microscopy maps the intended junction region before lithography, quantifies an apparent grain-boundary width, rejects pore-rich segments, and writes a nearby registration mark for site-specific pattern alignment. The apparent grain-boundary width provides a practical morphology metric, with narrower regions consistently yielding larger critical currents and characteristic voltages. Iterative optimization within this workflow further improves junction and device performance, reaching a liquid-nitrogen-temperature field-noise level of 40 fT Hz^(-1/2). This strategy turns local grain-boundary heterogeneity from an uncontrolled source of variability into a basis for site-selective fabrication, providing a route towards scalable manufacturing of low-noise HTS SQUIDs with high uniformity.
Comments12 pages, 4 figures
