arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1908.08689cond-mat.mes-hall
收藏

InAs-based拓扑异质结构表面的修复

Repairing the Surface of InAs-based Topological Heterostructures

S. J. Pauka, J. D. S. Witt, C. N. Allen, B. Harlech-Jones, A. Jouan, G. C. Gardner, S. Gronin, T. Wang, C. Thomas, M. J. Manfra, D. J. Reilly, M. C. Cassidy

摘要:

拓扑保护量子位的候选系统包括基于异质结构的二维电子气(2DEG),该异质结构通过邻近效应表现出强的自旋轨道相互作用(SOI)和超导性。对于InAs或InSb基材料,需要形成浅量子阱以产生硬带隙的$p$波超导态,这通常会使它们受到制造引起的损伤,从而限制了它们的迁移率。在这里,我们研究在处理InAs 2DEG量子阱的散射机制,并展示了一种手段,通过修复的半导体介电界面,增加其流动性。钝化带电的杂质状态与氩-氢等离子体的结果在一个显着的增加,在测量的迁移率和减少其方差相对于未处理的样品,高达45300 cm $^2$ /(V s)在10 nm深的量子阱。

英文摘要:

Candidate systems for topologically-protected qubits include two-dimensional electron gases (2DEGs) based on heterostructures exhibiting a strong spin-orbit interaction (SOI) and superconductivity via the proximity effect. For InAs- or InSb-based materials, the need to form shallow quantum wells to create a hard-gapped $p$-wave superconducting state often subjects them to fabrication-induced damage, limiting their mobility. Here we examine scattering mechanisms in processed InAs 2DEG quantum wells and demonstrate a means of increasing their mobility via repairing the semiconductor-dielectric interface. Passivation of charged impurity states with an argon-hydrogen plasma results in a significant increase in the measured mobility and reduction in its variance relative to untreated samples, up to 45300 cm$^2$/(V s) in a 10 nm deep quantum well.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑