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arXiv 1506.05971cond-mat.mes-hall
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InAs/GaSb异质结构中的栅控半金属-拓扑绝缘体转变

Gate-controlled semimetal-topological insulator transition in an InAs/GaSb heterostructure

Kyoichi Suzuki, Yuichi Harada, Koji Onomitsu, Koji Muraki

摘要:

我们报道了半金属InAs/GaSb异质结构到拓扑绝缘体的栅控转变。通过降低带反转的程度与前和背栅电压引起的过渡。纵向电阻峰的温度依赖性表明,随着栅极电场的增加,体区域中的能隙打开。体传导的抑制和过渡到一个拓扑绝缘体确认使用双锁定技术,这使我们能够严格比较不同的电流路径的样品中的电压分布,而不受随时间变化的电阻波动的影响的非局部电阻测量。

英文摘要:

We report a gate-controlled transition of a semimetallic InAs/GaSb heterostructure to a topological insulator. The transition is induced by decreasing the degree of band inversion with front and back gate voltages. Temperature dependence of the longitudinal resistance peak shows the energy gap opening in the bulk region with increasing gate electric field. The suppression of bulk conduction and the transition to a topological insulator are confirmed by nonlocal resistance measurements using a dual lock-in technique, which allows us to rigorously compare the voltage distribution in the sample for different current paths without the influence of time-dependent resistance fluctuations.

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