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arXiv 1607.04896cond-mat.mes-hall
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具有非均匀体厚度的可扩展GaSb/InAs隧道FET

Scalable GaSb/InAs tunnel FETs with non-uniform body thickness

Jun Z. Huang, Pengyu Long, Michael Povolotskyi, Gerhard Klimeck, Mark J. W. Rodwell

摘要:

GaSb/InAs异质结隧穿场效应晶体管具有亚阈值摆幅大、通态电流大($I_{\rm{ON}}$)的优点,是未来低功耗集成电路的强有力候选器件。然而,在短的通道长度,他们遭受来自小的带隙和小的有效质量的InAs通道的大隧穿泄漏。如本文所提出的,通过减小沟道厚度同时保留厚的源极-沟道隧道结,从而形成具有非均匀体厚度的设计,可以显著减轻该问题。由于量子限制,薄的InAs沟道提供了大的带隙和大的有效质量,减少了双极和源漏隧穿泄漏在截止状态。厚的GaSb/InAs隧道结,相反,提供了一个低的隧道势垒和小的有效质量,允许一个大的隧道概率在ON状态。此外,限制诱导的带不连续性增强了隧道电场并产生共振态,进一步改善了$I_{\rm{ON}}$。原子量子输运模拟表明,在15 nm沟道长度、$I_{\rm{OFF}}=1\times10^{-3}$ A/m和$V_{\rm{DD}}=0.3$ V下,可获得弹道式$I_{\rm{ON}}=284$ A/m。而在均匀体厚度下,可获得的最大$I_{\rm{ON}}$仅为25 A/m。模拟还表明,该设计可扩展到亚10 nm的沟道长度。

英文摘要:

GaSb/InAs heterojunction tunnel field-effect transistors are strong candidates in building future low-power integrated circuits, as they could provide both steep subthreshold swing and large ON-state current ($I_{\rm{ON}}$). However, at short channel lengths they suffer from large tunneling leakage originating from the small band gap and small effective masses of the InAs channel. As proposed in this article, this problem can be significantly mitigated by reducing the channel thickness meanwhile retaining a thick source-channel tunnel junction, thus forming a design with a non-uniform body thickness. Because of the quantum confinement, the thin InAs channel offers a large band gap and large effective masses, reducing the ambipolar and source-to-drain tunneling leakage at OFF state. The thick GaSb/InAs tunnel junction, instead, offers a low tunnel barrier and small effective masses, allowing a large tunnel probability at ON state. In addition, the confinement induced band discontinuity enhances the tunnel electric field and creates a resonant state, further improving $I_{\rm{ON}}$. Atomistic quantum transport simulations show that ballistic $I_{\rm{ON}}=284$A/m is obtained at 15nm channel length, $I_{\rm{OFF}}=1\times10^{-3}$A/m, and $V_{\rm{DD}}=0.3$V. While with uniform body thickness, the largest achievable $I_{\rm{ON}}$ is only 25A/m. Simulations also indicate that this design is scalable to sub-10nm channel length.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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