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arXiv 1503.06498cond-mat.mtrl-sci
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抑制Bi2Se3薄膜中的孪晶形成

Suppressing twin formation in Bi2Se3 thin films

N. V. Tarakina, S. Schreyeck, M. Luysberg, S. Grauer, C. Schumacher, G. Karczewski, K. Brunner, C. Gould, H. Buhmann, R. E. Dunin-Borkowski, L. W. Molenkamp

摘要:

利用X射线衍射、X射线反射率、原子力显微镜和探针校正扫描透射电子显微镜对分子束外延生长在不同表面粗糙度的InP(111)A和InP(111)B衬底上的Bi_2Se_3拓扑绝缘体薄膜的微结构进行了详细的研究。使用粗糙的Fe掺杂InP(111)B衬底导致完全抑制了Bi 2Se 3薄膜中的孪晶形成,并在薄膜与其衬底之间形成了完美的界面。唯一类型的结构缺陷,坚持在“无孪晶”的薄膜是反相域边界,这是与衬底高度的变化。它还表明,基板表面终止决定哪个家庭的孪生域占主导地位。

英文摘要:

The microstructure of Bi2Se3 topological-insulator thin films grown by molecular beam epitaxy on InP(111)A and InP(111)B substrates that have different surface roughnesses has been studied in detail using X-ray diffraction, X-ray reflectivity, atomic force microscopy and probe-corrected scanning transmission electron microscopy. The use of a rough Fe-doped InP(111)B substrate results in complete suppression of twin formation in the Bi2Se3 thin films and a perfect interface between the films and their substrates. The only type of structural defects that persist in the "twin-free" films is an antiphase domain boundary, which is associated with variations in substrate height. It is also shown that the substrate surface termination determines which family of twin domains dominates.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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