arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1302.3015cond-mat.mtrl-sci
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杂质半导体中表面复合速度本征值的缺失

Absence of an intrinsic value for the surface recombination velocity in doped semiconductors

F. Cadiz, D. Paget, V. L. Berkovits, V. P. Ulin, S. Arscott, E. Peytavit, A. C. H. Rowe

摘要:

对于掺杂在10 $^{16}$ cm $^{-3}$范围以上的n型和p型半导体,给出了表面复合速度$S$和表面费米能级解钉扎能作为光激发功率($P$)的函数的自洽表达式.测量$S$的p型GaAs薄膜使用一种新的偏振微发光技术被用来说明两个极限情况下的模型。对于自然氧化的表面,$S$由$P$中的幂律描述,而对于钝化的表面,$S^{-1}$随$P$而变化。此外,发现$S$随表面态密度和体掺杂水平的变化是费米能级解除钉扎的结果,而不是本征表面复合速度的变化。它的结论是,$S$依赖于$P$在整个实验可达到的范围内的激发功率,因此,没有固有值可以确定。因此,以前报道的半导体材料范围内的$S$值仅对特定的激发功率有效。

英文摘要:

A self-consistent expression for the surface recombination velocity $S$ and the surface Fermi level unpinning energy as a function of light excitation power ($P$) is presented for n- and p-type semiconductors doped above the 10$^{16}$ cm$^{-3}$ range. Measurements of $S$ on p-type GaAs films using a novel polarized microluminescence technique are used to illustrate two limiting cases of the model. For a naturally oxidized surface $S$ is described by a power law in $P$ whereas for a passivated surface $S^{-1}$ varies logarithmically with $P$. Furthermore, the variation in $S$ with surface state density and bulk doping level is found to be the result of Fermi level unpinning rather than a change in the intrinsic surface recombination velocity. It is concluded that $S$ depends on $P$ throughout the experimentally accessible range of excitation powers and therefore that no instrinsic value can be determined. Previously reported values of $S$ on a range of semiconducting materials are thus only valid for a specific excitation power.

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