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arXiv 1003.1371cond-mat.mes-hallcond-mat.mtrl-sci
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硅衬底上富勒烯基分子结的制备及电学性质

Synthesis and electrical properties of fullerene-based molecular junctions on silicon substrate

D. Guerin, S. Lenfant, S. Godey, D. Vuillaume

摘要:

本文报道了在硅衬底上制备富勒烯基分子结的方法和电学性质。在硅衬底上,高π共轭分子C60(π量子阱)通过烷基链(σ隧道势垒)与电极隔离。首先,Si/SiO2/ \sigmaC 60结构通过顺序合成(3种不同路线)或通过直接接枝预合成的C60-σ-Si(OEt)3分子来制备。我们描述了这些路线的化学合成和分子单分子膜的物理化学性质。然后,在Si/SiO2/σC60结上用硫醇化的悬汞电极添加第二个σ隧道势垒。我们比较了Si/SiO2/σC60//Hg和Si/SiO2/σC60// \sigmaHg分子结的电子输运性质,并通过跃迁电压谱证明了通过改变C60核与Hg金属电极之间的烷基链长度(即C60核与Hg金属电极之间的烷基链长度),可以将富勒烯LUMO -金属费米能级偏移从~ 0.2 eV调整到~ 1 eV。e.从直接C60//Hg接触到14个碳原子隧道势垒)。

英文摘要:

We report the synthesis and the electrical properties of fullerene-based molecular junctions on silicon substrate in which the highly π-conjugated molecule C60 (πquantum well) is isolated from the electrodes by alkyl chains (σtunnel barriers). Initially, the Si/SiO2/\sigmaC60 architecture was prepared either by sequential synthesis (3 different routes) or by direct grafting of the presynthesized C60-σ-Si(OEt)3 molecule. We described the chemical synthesis of these routes and the physico-chemical properties of the molecular monolayers. Then, the second σtunnel barrier was added on the Si/SiO2/σC60 junction by applying a hanging mercury drop electrode thiolated with an alkanethiol monolayer. We compared the electronic transport properties of the Si/SiO2/σC60//Hg and Si/SiO2/σC60//\sigmaHg molecular junctions, and we demonstrated by transition voltage spectroscopy that the fullerene LUMO - metal Fermi energy offset can be tailored from ~ 0.2 eV to ~ 1 eV by changing the length of the alkyl chain between the C60 core and the Hg metal electrode (i. e. from direct C60//Hg contact to 14 carbon atoms tunnel barrier).

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