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arXiv 1002.0427cond-mat.mtrl-scicond-mat.mes-hall
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硅纳米线带隙改性

Silicon nanowire band gap modification

Michael Nolan, Sean O'Callaghan, Giorgos Fagas, James C. Greer, Thomas Frauenheim

摘要:

采用密度泛函理论研究了不同种类的表面终止剂对小直径(1 nm)硅纳米线带隙的影响.由于量子限制,小直径的导线表现出直接带隙,随着导线直径变窄而增加,而与表面终止无关。这种效应已经在以前的实验和理论研究中观察到的氢化线。对于固定的横截面,用于饱和硅表面的官能团显著地改变了带隙,导致高达电子伏特的相对能量偏移。带隙位移的细节追踪到硅价带和前线轨道的终止基团,这是在竞争与量子限制之间的杂交。

英文摘要:

Band gap modification for small-diameter (1 nm) silicon nanowires resulting from the use of different species for surface termination is investigated by density functional theory calculations. Because of quantum confinement, small-diameter wires exhibit a direct band gap that increases as the wire diameter narrows, irrespective of surface termination. This effect has been observed in previous experimental and theoretical studies for hydrogenated wires. For a fixed cross-section, the functional group used to saturate the silicon surface significantly modifies the band gap, resulting in relative energy shifts of up to an electronvolt. The band gap shifts are traced to details of the hybridization between the silicon valence band and the frontier orbitals of the terminating group, which is in competition with quantum confinement.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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