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arXiv 0908.1536cond-mat.mtrl-sci
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硅单晶表面的相干散射

Coherent scattering from silicon mocrystal surface

F. Livet, G. Beutier, M. de Boissieu, S. Ravy, F. Picca, D. Le Bolloc'h, V. Jacques

摘要:

使用相干X射线散射,我们证明了原子台阶粗糙度在[111]邻位表面的硅单晶的0.05度错位。在倒易空间的(1/2 1/2 1/2)反布拉格位置附近(该位置对[111]表面特别敏感),截断棒呈现出对比散斑图案,该对比散斑图案合并成更接近本体的(111)布拉格峰的单个峰。沿[111]方向的散斑的细长形状证实了该技术的单原子阶跃灵敏度。该实验为研究晶体表面的阶跃动力学开辟了道路。

英文摘要:

Using coherent x-ray scattering, we evidenced atomic step roughness at the [111] vicinal surface of a silicon monocrystal of 0.05 degree miscut. Close to the (1/2 1/2 1/2) anti-Bragg position of the reciprocal space which is particularly sensitive to the [111] surface, the truncation rod exhibits a contrasted speckle pattern that merges into a single peak closer to the (111) Bragg peak of the bulk. The elongated shape of the speckles along the[111] direction confirms the monoatomic step sensibility of the technique. This experiment opens the way towards studies of step dynamics on crystalline surfaces.

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