arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1306.3367cond-mat.mtrl-sci
收藏

利用部分相干X射线纳米束研究应变绝缘体上硅线的时间相关弛豫

Time-dependent relaxation of strained silicon-on-insulator lines using a partially coherent x-ray nanobeam

Francesca Mastropietro, Joël Eymery, Gerardina Carbone, Sophie Baudot, François Andrieu, Vincent Favre-Nicolin

摘要:

我们报告了一条截面为200 × 70 nm^2的应变绝缘体上硅(sSOI)线的应变图的定量测定。为了研究作为时间的函数的单条线,我们使用了具有松弛相干特性的X射线纳米束作为光束尺寸、相干性和强度之间的折衷。我们演示了如何在纳米尺度上重建线变形,并在X射线纳米束的影响下,随着线的弛豫,跟踪其演变。

英文摘要:

We report on the quantitative determination of the strain map in a strained Silicon-On-Insulator (sSOI) line with a 200x70 nm^2 cross-section. In order to study a single line as a function of time, we used an X-ray nanobeam with relaxed coherence properties as a compromise between beam size, coherence and intensity. We demonstrate how it is possible to reconstruct the line deformation at the nanoscale, and follow its evolution as the line relaxes under the influence of the X-ray nanobeam.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑