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arXiv 0906.1896physics.opticsphysics.comp-ph
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电磁场模拟的严格方法基准

Benchmark of Rigorous Methods for Electromagnetic Field Simulations

S. Burger, L. Zschiedrich, F. Schmidt, P. Evanschitzky, A. Erdmann

摘要:

我们已经开发了一个接口,允许执行严格的电磁场(EMF)模拟与模拟器JCMsuite和随后的航空成像和抗蚀剂模拟与模拟器Dr.LiTHO.结合工具,我们调查的收敛性的近场和远场的结果为不同的深紫外掩模。我们还基准测试结果与波导方法EMF求解器包括在博士LiTHO和有限元法EMF求解器JCMsuite。我们展示了密集和孤立的孔阵列,包括对角结构的掩模,和横向尺寸为10微米的大型3D掩模图案的收敛结果。

英文摘要:

We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO. With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.

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