arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 0804.2587physics.opticsphysics.comp-ph
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非周期掩模图形中光传输的有限元模拟

Finite Element Simulation of Light Propagation in Non-Periodic Mask Patterns

L. Zschiedrich, F. Schmidt

摘要:

严格的电磁场模拟是散射测量和掩模图案设计的重要组成部分。今天,主要是周期性的结构被认为是在模拟。非周期性结构通常由大的、人工周期化的计算域建模。对于具有大影响半径的系统,这导致非常大的计算域以保持误差足够小。在本文中,我们回顾了最近的进展,严格模拟孤立结构嵌入到周围的介质。我们特别解决的情况下,一个分层的周围介质(掩模或晶圆)与其他无限的不均匀性,如抗蚀剂线。在此基础上,详细介绍了如何在非周期环境下提取空间像计算所需的远场信息。

英文摘要:

Rigorous electromagnetic field simulations are an essential part for scatterometry and mask pattern design. Today mainly periodic structures are considered in simulations. Non-periodic structures are typically modeled by large, artificially periodified computational domains. For systems with a large radius of influence this leads to very large computational domains to keep the error sufficiently small. In this paper we review recent advances in the rigorous simulation of isolated structures embedded into a surrounding media. We especially address the situation of a layered surrounding media (mask or wafer) with additional infinite inhomogeneities such as resist lines. Further we detail how to extract the far field information needed for the aerial image computation in the non-periodic setting.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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