孤立和周期性三维光掩模图形的电磁场模拟
Electromagnetic Field Simulations of Isolated and Periodic 3D Photomask Patterns
摘要：
我们提出了严格的三维电磁场模拟孤立的功能，使用新开发的有限元方法的光掩模。我们报告的有限元求解器JCMsuite，结合高阶边缘元素，自适应细化方法，快速求解算法的当前状态。我们证明，严格和准确的结果光散射关闭孤立的功能，可以实现在相对较低的计算成本，相比，标准的方法模拟大间距，周期性的计算域。
英文摘要：
We present rigorous 3D EMF simulations of isolated features on photomasks using a newly developed finite-element method. We report on the current status of the finite-element solver JCMsuite, incorporating higher-order edge elements, adaptive refinement methods, and fast solution algorithms. We demonstrate that rigorous and accurate results on light scattering off isolated features can be achived at relatively low computational cost, compared to the standard approach of simulations on large-pitch, periodic computational domains.
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