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arXiv 0902.1814cond-mat.mtrl-sci
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热处理对氢化非晶Si/Ge多层膜结构的影响

Structural modifications induced in hydrogenated amorphous Si/Ge multilayers by heat treatments

C. Frigeri, M. Serenyi, A. Csik, Z. Erdelyi, D. L. Beke, L. Nasi

摘要:

本文研究了用溅射法制备的氢化非晶Si/Ge多层膜在退火条件下的结构变化。退火改变了所沉积的多层膜的结构,除了这里应用的不太严格的条件(150 oC,时间<22 h)。对于较高的温度和/或时间,改性包括层混合和凹凸和弹坑形状的表面降解。它们被认为是由于加热时形成的H气泡。氢应该主要从非晶Ge层释放。

英文摘要:

A study is presented of the structural changes occurring as a function of the annealing conditions in hydrogenated amorphous Si/Ge multilayers prepared by sputtering. Annealing changes the structure of the as-deposited multilayer except for the less severe conditions here applied (150 oC, time<22 h). For higher temperatures and/or times, the modifications consist of layer intermixing and surface degradation in the shape of bumps and craters. They are argued to be due to the formation of H bubbles upon heating. Hydrogen should be mostly released from the amorphous Ge layers.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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