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arXiv 2006.01907cond-mat.mtrl-sci
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氢化非晶硅中纳米级密度波动的量化

Quantification of nanoscale density fluctuations in hydrogenated amorphous silicon

Eike Gericke, Jimmy Melskens, Robert Wendt, Markus Wollgarten, Armin Hoell, Klaus Lips

摘要:

利用小角X射线(SAXS)和中子散射(SANS)相结合的方法研究了氢化非晶硅(a-Si:H)的纳米结构,空间分辨率为0.8nm。a-Si:H材料是使用一系列广泛变化的条件沉积的,并且是这类材料的代表。我们确定了两个不同的阶段,这是嵌入在a-Si:H矩阵和量化都根据他们的散射截面。首先,检测到1.2 nm尺寸的空隙(具有多于10个缺失原子的多偶性),其形成具有1.6 nm空隙到空隙距离的超晶格。在以高速率沉积的a-Si:H材料中,发现空穴的浓度高达6*10^19 ccm。第二,发现了平均直径为1 nm的贫氢的致密有序畴(DOD),DOD倾向于形成10-15 nm尺寸的聚集体,并且在本文考虑的所有a-Si:H材料中大量发现。这些定量研究结果使人们有可能了解a-Si:H的结构和电子性质之间的复杂关系,并直接将它们与光诱导缺陷的形成联系起来。最后,推导了一个结构模型,验证了理论预测的a-Si:H纳米结构。

英文摘要:

The nanostructure of hydrogenated amorphous silicon (a Si:H) is studied by a combination of small-angle X-ray (SAXS) and neutron scattering (SANS) with a spatial resolution of 0.8 nm. The a-Si:H materials were deposited using a range of widely varied conditions and are representative for this class of materials. We identify two different phases which are embedded in the a-Si:H matrix and quantified both according to their scattering cross-sections. First, 1.2 nm sized voids (multivacancies with more than 10 missing atoms) which form a superlattice with 1.6 nm void-to-void distance are detected. The voids are found in concentrations as high as 6*10^19 ccm in a-Si:H material that is deposited at a high rate. Second, dense ordered domains (DOD) that are depleted of hydrogen with 1 nm average diameter are found. The DOD tend to form 10-15 nm sized aggregates and are largely found in all a-Si:H materials considered here. These quantitative findings make it possible to understand the complex correlation between structure and electronic properties of a-Si:H and directly link them to the light-induced formation of defects. Finally, a structural model is derived, which verifies theoretical predictions about the nanostructure of a-Si:H.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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