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arXiv 0811.3167cond-mat.supr-concond-mat.str-el
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氧还原对电子掺杂Sr1-xLaxCuO2薄膜结构和电子性质的影响

Influence of oxygen reduction on the structural and electronic properties of electron-doped Sr1-xLaxCuO2 thin films

Z. Z. Li, V. Jovanovic, H. Raffy, S. Megtert

摘要:

采用射频反应溅射法在KTaO 3和DyScO 3衬底上外延生长了单相c轴取向e掺杂Sr 1-xLaxCuO 2薄膜。生长的薄膜由于氧过剩而绝缘,氧还原是观察超导性所必需的。为了达到超导性,采用了两种不同的方法。一方面,在两种类型的基板上沉积的一系列薄膜上进行原位还原过程。另一方面,异位还原程序上依次进行沉积在DyScO 3上的单个膜。氧还原对薄膜的结构和电子性质的影响的研究提出和讨论。

英文摘要:

Single phase, c-axis oriented, e-doped, Sr1-xLaxCuO2 thin films were epitaxially grown on KTaO3 and DyScO3 substrates by reactive rf sputtering. As-grown films being insulating due to oxygen excess, oxygen reduction is necessary to observe superconductivity. Two different procedures were employed to reach superconductivity. On one hand an in-situ reduction process was conducted on a series of films deposited on both types of substrates. On the other hand, an ex-situ reduction procedure was performed sequentially on a single film deposited on DyScO3. The study of the influence of oxygen reduction on the structural and electronic properties of the thin films is presented and discussed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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