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arXiv quant-ph/0103035quant-ph

Two-photon diffraction and quantum lithography

Milena D'Angelo, Maria V. Chekhova, Yanhua H. Shih

英文摘要:

We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have bettered the classical diffraction limit by a factor of two. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.

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