We propose a super-resolution quantum lithography scheme based on coherent population trapping in lambda-type atoms coupled to temporally-cascaded standing-wave driving fields. By realizing effective multiplication of optical intensity profiles on an atomic state density distribution, the scheme enables an arbitrarily high degree of resolution enhancement without modifying the atomic level structure of the photographic medium or the light source configuration. It is also shown that the visibility of the super-resolution patterns is preserved under a significant atomic state decoherence rate.
Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.
We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have bettered the classical diffraction limit by a factor of two. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.
Classical, interferometric, optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result surpasses the usual classical diffraction limit by a factor of N. Since the number of features that can be etched on a two-dimensional surface scales inversely as the square of the feature size, this allows one to write a factor of N^2 more elements on…
The Abbe's diffraction limit restricts the resolution of an optical imaging and lithography system. Coherent Rabi oscillation is shown to be able to overcome the diffraction limit in both optical and atom lithography. In previous studies, semiclassical theory is applied where the driving field is treated as a classical light and quantum fluctuation is neglected. Here, we show that the quantum fluctuation may reduce the visibility of the superresolution pattern. However, by squeezing the photon number fluctuation we are able to significantly increase its visibility.
Diffraction of light sets the fundamental limit for optical lithography. Many quantum lithography schemes have so far been proposed to overcome this limit either by making use of highly entangled photons, multi-photon processes or multiple Lambda transitions, which are all experimentally high-demanding. Recently, Liao et al. proposed a novel quantum lithography scheme which merely employs Rabi oscillation to surpass the diffraction limit. Here we report a faithful experimental realization of this scheme. Resolution up to ninth of the Rayleigh diffraction limit has been observed. Possibility of…
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.
I propose a quantum imaging method that can beat the Rayleigh-Abbe diffraction limit and achieve de Broglie resolution without requiring a multiphoton absorber as the detector. Using the same non-classical states of light as those for quantum lithography, the proposed method requires only intensity measurements, followed by image post-processing, to produce the same complex image patterns as those in quantum lithography. The method is expected to be experimentally realizable using current technology.
We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a $(N+1) \times (N+1)$ grid, occupying a square with the side half a wavelength long, can be generated from a $2 N$-photon state.
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the "quantum weight" from the electromagnetic field to the lithographic material. We show how a practical complete lithographic scheme can be developed and demonstrate the underlying principles experimental…
The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental demonstration of quantum interference lithography with complex molecules. Molecular matter-wave interference patterns are deposited onto a reconstructed Si(111) 7x7 surface and imaged using scanning tunneling microscopy. Thereby both the particle and the quantum wave character of the molecules can be visualized in one and the same image. This new approach to nano…
In superconducting quantum devices, air bridges enable increased circuit complexity and density as well as mitigate the risk of microwave loss arising from mode mixing. We implement aluminum air bridges using a simple process based on single-step electron-beam gradient exposure. The resulting bridges have sizes ranging from $20~μm$ to $100~μm$, with a yield exceeding $99~\%$ for lengths up to $36~μm$. When used to connect ground planes in coplanar waveguide resonators, the induced loss contributed to the system is negligible, corresponding to a reduction of the quality factor exceeding $1.0\ti…
We report an experimental observation of quantum Airy disk diffraction pattern using an entangled two-photon source. In contrast to the previous quantum lithography experiments where the subwavelength diffraction patterns were observed in the far field limit, we perform the Fraunhofer diffraction experiment with a convex lens. The experimental result shows that the two-photon Airy disk is provided with the super-resolution spot, which surpasses the classical diffraction limit. In particular, the spot size can be well controlled by the focal length, which adapted to optical super-focusing. Our …
We demonstrate a systematic approach to sub-wavelength resolution lithographic image formation on films covering areas larger than a wavelength squared. For example, it is possible to make a lithographic pattern with a feature size resolution of $λ/[2(N+1)]$ by using a particular $2 M$-photon, multi-mode entangled state, where $N < M$, and banks of birefringent plates. By preparing a statistically mixed such a state one can form any pixel pattern on a $(N+1) 2^{M-N} \times (N+1) 2^{M-N}$ pixel grid occupying a square with a side of $L=2^{M-N-1}$ wavelengths. Hence, there is a trade-off between…
We study the possibility of creating spatial patterns having subwavelength size by using the so-called dark states formed by the interaction between atoms and optical fields. These optical fields have a specified spatial distribution. Our experiments in Rb vapor display spatial patterns that are smaller than the length determined by the diffraction limit of the optical system used in the experiment. This approach may have applications to interference lithography and might be used in coherent Raman spectroscopy to create patterns with subwavelength spatial resolution.
Over the past 20 years, bright sources of entangled photons have led to a renaissance in quantum optical interferometry. Optical interferometry has been used to test the foundations of quantum mechanics and implement some of the novel ideas associated with quantum entanglement such as quantum teleportation, quantum cryptography, quantum lithography, quantum computing logic gates, and quantum metrology. In this paper, we focus on the new ways that have been developed to exploit quantum optical entanglement in quantum metrology to beat the shot-noise limit, which can be used, e.g., in fiber opti…
No imaging apparatus can produce perfect images: spatial resolution is limited by the Rayleigh diffraction bound that is a consequence of the imager's finite spatial extent. We show some N-photon strategies that permit resolution of details that are smaller than this bound, attaining either a 1/sqrt(N) enhancement (standard quantum limit) or a 1/N enhancement (Heisenberg limit) over standard techniques. In the incoherent imaging regime, the methods presented are loss resistant, because they can be implemented with classical-state light sources. Our results may be of importance in many applicat…
High-precision measurements implemented by means of light is desired in all fields of science. However, light is a wave and Rayleigh criterion gives us a diffraction limitation in classical optics which restricts to get arbitrary high resolution. Sub-wavelength interference has a potential application in lithography to beat the classical Rayleigh limit of resolution. We carefully study the second-order correlation theory to get the physics behind sub-wavelength interference in photon coincidence detection. A Young's double-slit experiment with pseudo-thermal light is carried out to test the se…
