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arXiv quant-ph/0305042quant-ph

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

Ole Steuernagel

英文摘要:

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.

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