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arXiv quant-ph/0310046quant-ph
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宏观观测中的量子光刻

Quantum Lithography in Macroscopic Observations

De-Zhong Cao, Kaige Wang

摘要:

研究了自发参量下转换(SPDC)光束的广义杨氏双缝干涉。我们发现,无论是双光子强度测量还是单光子空间强度相关测量,亚波长光刻都可以在宏观上发生。给出了与SPDC相互作用有关的干涉条纹的可见度和强度。在实际应用中,它可以提供具有中等可见性的强量子光刻。

英文摘要:

We study the generalized Young's double-slit interference for the beam produced in the spontaneously parametric down-conversion (SPDC). We find that the sub-wavelength lithography can occur macroscopically in both the two-photon intensity measurement and the single-photon spatial intensity correlation measurement. We show the visibility and the strength of the interference fringe related to the SPDC interaction. It may provide a strong quantum lithography with a moderate visibility in practical application.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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