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arXiv cond-mat/0412349cond-mat.mtrl-sci
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化学掺杂接触的高性能N型碳纳米管场效应晶体管

High Performance N-Type Carbon Nanotube Field Effect Transistors with Chemically Doped Contacts

Ali Javey, Ryan Tu, Damon Farmer, Jing Guo, Roy Gordon, Hongjie Dai

摘要:

制备了短沟道(~80 nm)的具有钾(K)掺杂的源极和漏极区以及高k栅介质(ALD HfO2)的n型单壁碳纳米管(SWNT)场效应晶体管(FET)。对于直径约为1.6 nm,带隙约为0.55 eV的纳米管,我们获得了n-MOSFET类器件,由于接触处的化学抑制肖特基势垒,亚阈值摆幅为70 mV/decade,可以忽略的双极导电和高开/关比,在0.5V的偏置电压下高达10^6。结果与最先进的硅n-MOSFET相比毫不逊色,并证明了SWNT在未来互补电子学中的潜力。讨论了掺杂浓度对纳米管器件电学特性的影响。

英文摘要:

Short channel (~80 nm) n-type single-walled carbon nanotube (SWNT) field-effect transistors (FETs) with potassium (K) doped source and drain regions and high-k gate dielectrics (ALD HfO2) are obtained. For nanotubes with diameter ~ 1.6 nm and bandgap ~ 0.55 eV, we obtain n-MOSFET-like devices exhibiting high on-currents due to chemically suppressed Schottky barriers at the contacts, subthreshold swing of 70mV/decade, negligible ambipolar conduction and high on/off ratios up to 10^6 at a bias voltage of 0.5V. The results compare favorably with the state-of-the-art silicon n-MOSFETs and demonstrate the potential of SWNTs for future complementary electronics. The effects of doping level on the electrical characteristics of the nanotube devices are discussed.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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