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arXiv 0707.3176cond-mat.mtrl-scicond-mat.mes-hall
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双极型碳纳米管晶体管pn结和局部缺陷的光电流成像

Photocurrent Imaging of p-n Junctions and Local Defects in Ambipolar Carbon Nanotube Transistors

Y. H. Ahn, Wei Tsen, Bio Kim, Yung Woo Park, Jiwoong Park

摘要:

利用扫描光电流显微镜(SPCM)研究了双极型碳纳米管(CNT)晶体管内部pn结的特性以及局部缺陷。我们的SPCM图像显示了金属接触附近的强信号,其极性和位置根据栅极偏置而变化。结合整体电导分析的SPCM图像还表明在n型操作制度中接触附近的内部pn结的存在和栅极依赖的演变。为了以纳米级分辨率确定pn结位置和耗尽宽度,使用高斯拟合。我们还测量了CNT器件在不同栅偏压下的电势分布,这表明使用SPCM技术可以成像局部缺陷和感应电场。我们的实验清楚地表明,SPCM是一个有价值的工具,用于成像和优化基于CNT的器件的电气和光电性能。

英文摘要:

We use scanning photocurrent microscopy (SPCM) to investigate the properties of internal p-n junctions as well as local defects in ambipolar carbon nanotube (CNT) transistors. Our SPCM images show strong signals near metal contacts whose polarity and positions change depending on the gate bias. SPCM images analyzed in conjunction with the overall conductance also indicate the existence and gate-dependent evolution of internal p-n junctions near contacts in the n-type operation regime. To determine the p-n junction position and the depletion width with a nanometer scale resolution, a Gaussian fit was used. We also measure the electric potential profile of CNT devices at different gate biases, which shows that both local defects and induced electric fields can be imaged using the SPCM technique. Our experiment clearly demonstrates that SPCM is a valuable tool for imaging and optimizing electrical and optoelectronic properties of CNT based devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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