arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2603.23958cond-mat.mtrl-sci
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aberration corrected 高分辨率透射电子显微镜在材料科学中的基础与应用

Fundamentals and applications of aberration corrected high resolution transmission electron microscopy in materials science

International Center for Materials Science, Jawaharlal Nehru Centre for Advanced Scientific Research (JNCASR)(印度高级科学研究中心国际材料科学中心)

Ranjan Datta, Sneha Kobri M., Sudip Mahato

AI总结:

本文综述了 aberration corrected 高分辨率透射电子显微镜在材料结构表征中的基础原理与应用,涵盖像差校正、直接图像解释及相位对比成像等方法,探讨了其在原子尺度材料研究中的潜力。

摘要:

本文综述了 aberration corrected 高分辨率透射电子显微镜在材料结构表征中的基础原理与应用。文章涵盖了像差的基本原理、像差校正器、直接图像解释与负 Cs 相位对比显微镜,以及与偏轴电子全息、电子ptychography、差分相位对比显微镜等方法的比较。此外,还介绍了在原子尺度上进行定量成像的各种材料示例,以及与图像模拟和重建方法相关的相位信息检索技术。随着仪器和记录设备的显著进步,文章还概述了这些工具和方法在解决具有挑战性的材料科学问题中的潜在未来前景。

英文摘要:

In this review article fundamentals of aberration corrected phase contrast transmission electron microscopy for the structural characterization of materials at atomic length scale is presented. The word structure entails atomic arrangement as well as electronic structure information of the materials. The article summarily covers a range of topics on the basics of aberrations, aberration correctors, direct image interpretation with negative Cs phase contrast microscopy, a discussion in comparison with the competitive atomic resolution phase contrast methods for example, off-axis electron holography, electron ptychography, differential phase contrast microscopy. Additionally, various examples of quantitative imaging of materials at atomic length scale, associated image simulation and reconstruction methods for retrieving the phase information are presented. With the tremendous advancement in instrumentation and recording devices, potential future perspective of such tools and methods in solving challenging materials science problems are outlined.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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