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arXiv 2404.01432physics.optics
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氮化硅平台中的近可见光拓扑边缘态

Near-Visible Topological Edge States in a Silicon Nitride Platform

David Sharp, Christopher Flower, Mahmoud Jalali Mehrabad, Arnab Manna, Hannah Rarick, Rui Chen, Mohammad Hafezi, Arka Majumdar

AI总结:

本文在氮化硅环形谐振器阵列中实现了约780 nm近可见光波段的光子拓扑边缘态,验证了其对制备无序的拓扑保护,为近可见光非线性和非厄米拓扑光子学奠定了基础。

摘要:

迄今为止,拓扑光子学的演示在很大程度上局限于红外波段,而在该波段成像技术和对低维量子材料的获取都受到限制。在此,我们设计并制备了氮化硅环形谐振器阵列,以在约780 nm处演示光子拓扑边缘态。我们观测到了对应于整数量子霍尔哈密顿量的边缘态,该边缘态对制备无序具有拓扑保护。该演示将拓扑边缘态的概念扩展到近可见光波段,并为利用丰富的近可见光量子发射体库开展非线性和非厄米拓扑光子学研究铺平了道路。

英文摘要:

Demonstrations of topological photonics have so far largely been confined to infrared wavelengths where imaging technology and access to low-dimensional quantum materials are both limited. Here, we designed and fabricated silicon nitride ring-resonator arrays to demonstrate photonic topological edge states at ~780 nm. We observed edge states corresponding to the integer quantum Hall Hamiltonian with topological protection against fabrication disorder. This demonstration extends the concept of topological edge states to the near-visible regime and paves the way for nonlinear and non-Hermitian topological photonics with the rich library of near-visible quantum emitters.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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