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arXiv 2005.13348physics.app-phphysics.optics

面向片上应用的富硅氮化硅的热光特性

Thermo-Optic Properties of Silicon-Rich Silicon Nitride for On-chip Applications

Hani Nejadriahi, Alex Friedman, Rajat Sharma, Steve Pappert, Yeshaiahu Fainman, Paul Yu

AI总结:

本研究表征了PECVD制备的不同硅含量富硅氮化硅薄膜的热光系数,揭示二者关联并测得最高值,还研制出高消光比、低功耗的SRN MMI热光开关,为片上光子应用提供支撑。

摘要:

我们展示了采用等离子体增强化学气相沉积(PECVD)制备的富硅氮化硅(SRN)薄膜的热光特性。通过马赫-曾德尔干涉仪(MZIs)的光谱响应随温度的偏移,表征了不同硅含量氮化硅薄膜的热光系数。研究证实氮化硅薄膜的硅含量与其热光系数存在明确关联,可实现的最高系数达(1.65±0.08)×10⁻⁴ K⁻¹。此外,我们制备了基于SRN多模干涉仪(MMI)的热光开关,消光比超过20 dB,两端口开关总功耗为50 mW。

英文摘要:

We demonstrate the thermo-optic properties of silicon-rich silicon nitride (SRN) films deposited using plasma-enhanced chemical vapor deposition (PECVD). Shifts in the spectral response of Mach-Zehnder Interferometers (MZIs) as a function of temperature were used to characterize the thermo-optic coefficients of silicon nitride films with varying silicon contents. A clear relation is demonstrated between the silicon content and the exhibited thermo-optic coefficient in silicon nitride films, with the highest achievable coefficient being as high as (1.65+/-0.08) x 10-4 K-1. Furthermore, we realize an SRN Multi-Mode Interferometer (MMI) based thermo-optic switch with over 20 dB extinction ratio and total power consumption for two-port switching of 50 mW.

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