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arXiv 1708.02873physics.optics
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材料成分对氮化硅薄膜体二次谐波产生的增强作用

Enhancement of bulk second-harmonic generation from silicon nitride films by material composition

K. Koskinen, R. Czaplicki, A. Slablab, T. Ning, A. Hermans, B. Kuyken, V. Mittal, G. S. Murugan, T. Niemi, R. Baets, M. Kaurenen

摘要:

我们提出了一个全面的张量表征的二次谐波产生的氮化硅薄膜具有不同的组成。样品采用等离子体增强化学气相沉积法制备,材料成分随工艺中反应气体混合物的不同而变化。我们发现最低和最高的二阶磁化率之间的六倍增强,最高值约为5 pm/V,来自最富硅的样品。此外,发现光损耗对于应用来说足够小(低于6 dB/cm)。张量的结果表明,所有的样品保持面内各向同性独立的硅含量,突出了制造过程的可控性。

英文摘要:

We present a comprehensive tensorial characterization of second-harmonic generation from silicon nitride films with varying composition. The samples were fabricated using plasma-enhanced chemical vapor deposition, and the material composition was varied by the reactive gas mixture in the process. We found a six-fold enhancement between the lowest and highest second-order susceptibility, with the highest value of approximately 5 pm/V from the most silicon-rich sample. Moreover, the optical losses were found to be sufficiently small (below 6 dB/cm) for applications. The tensorial results show that all samples retain in-plane isotropy independent of silicon content, highlighting the controllability of the fabrication process.

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