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arXiv 2307.13554cond-mat.mtrl-sci
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高电子温度下半导体中的电子-声子耦合

Electron-phonon coupling in semiconductors at high electronic temperatures

Nikita Medvedev

AI总结:

本文提出基于紧束缚分子动力学的非微扰方法,计算了14种辐照半导体在高达约25,000 K下的电子-声子耦合参数,发现非平衡与平衡态耦合参数差异最多约35%,证实可用单一电子温度表征。

摘要:

本文使用一种基于紧束缚分子动力学的非微扰动力学耦合方法,计算了辐照半导体中的电子-离子(电子-声子)耦合参数随电子温度(高达约25,000 K)的函数关系。该方法通过玻尔兹曼方程考虑了任意电子分布函数,从而能够对各种模型进行对比分析:完全平衡电子分布、能带分辨的局部平衡(价带和导带中电子具有不同的温度和化学势),以及完全非平衡分布。研究证明,在相同的沉积能量密度下,非平衡状态产生的电子-声子耦合参数与其平衡对应值最多相差约35%,这使得将耦合参数表示为单一电子等效(或动能)温度的函数成为可能。本文研究了以下14种半导体——IV族:Si、Ge、SiC;III-V族:AlAs、AlP、GaP、GaAs、GaSb;氧化物:ZnO、TiO2、Cu2O;层状PbI2;以及ZnS和B4C。

英文摘要:

A nonperturbative dynamical coupling approach based on tight-binding molecular dynamics is used to evaluate the electron-ion (electron-phonon) coupling parameter in irradiated semiconductors as a function of the electronic temperature up to ~25,000 K. The method accounts for arbitrary electronic distribution function via the Boltzmann equation, enabling a comparative analysis of various models: fully equilibrium electronic distribution, band-resolved local equilibria (distinct temperatures and chemical potential of electrons in the valence and the conduction band), and a full nonequilibrium distribution. It is demonstrated that the nonequilibrium produces the electron-phonon coupling parameter different by at most ~35% from its equilibrium counterpart for identical deposited energy density, allowing to use the coupling parameter as a function of the single electronic equivalent (or kinetic) temperature. The following 14 semiconductors are studied here - group IV: Si, Ge, SiC; group III-V: AlAs, AlP, GaP, GaAs, GaSb; oxides: ZnO, TiO2, Cu2O; layered PbI2; ZnS and B4C.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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