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arXiv 2302.09550cond-mat.mtrl-scicond-mat.other
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反铁磁 CuMnAs 和 Mn$_2$Au 器件中的磁畴工程

Magnetic domain engineering in antiferromagnetic CuMnAs and Mn$_2$Au devices

Sonka Reimers, Olena Gomonay, Oliver J. Amin, Filip Krizek, Luke X. Barton Yaryna Lytvynenko, Stuart Poole, Richard P. Campion, Vit Novák, Francesco Maccherozzi… 展开作者

Sonka Reimers, Olena Gomonay, Oliver J. Amin, Filip Krizek, Luke X. Barton Yaryna Lytvynenko, Stuart Poole, Richard P. Campion, Vit Novák, Francesco Maccherozzi, Dina Carbone, Alexander Björling, Yuran Niu, Evangelos Golias, Dominik Kriegner, Jairo Sinova, Mathias Kläui, Martin Jourdan, Sarnjeet S. Dhesi, Kevin W. Edmonds, Peter Wadley

AI总结:

本文通过器件图形化和应变工程调控 CuMnAs 与 Mn2Au 反铁磁薄膜的磁畴结构,结合 X 射线显微实验和理论模型揭示边缘各向异性与磁弹相互作用的共同作用机制,为反铁磁自旋电子器件的可扩展磁序控制奠定基础。

摘要:

反铁磁材料在具有快速工作频率和磁场鲁棒性的自旋电子器件中具有应用潜力。尽管近年来原理验证功能研究进展迅速,但对反铁磁畴形成与操控的理解仍明显不足,这导致对磁序的控制要么不完整,要么难以扩展。在此,我们展示了利用器件图形化和应变工程来影响 CuMnAs 和 Mn2Au 这两种反铁磁自旋电子学研究关键材料中畴结构的简单而有效的方法。通过比较两种不同材料的 X 射线显微数据,我们揭示了决定反铁磁器件中畴形成的关键参数,并展示了磁致伸缩、衬底钳制和边缘各向异性之间非平凡的相互作用如何导致特定的平衡畴构型。更具体地说,我们观察到图形化边缘在长距离上对磁各向异性和畴结构具有显著影响,并提出了一个将短程边缘各向异性与长程磁弹相互作用联系起来的理论模型。所引用的原理普遍适用于反铁磁薄膜中的畴形成与工程,这将为实现真正功能化的反铁磁器件铺平道路。

英文摘要:

Antiferromagnetic materials hold potential for use in spintronic devices with fast operation frequencies and field robustness. Despite the rapid progress in proof-of-principle functionality in recent years, there has been a notable lack of understanding of antiferromagnetic domain formation and manipulation, which translates to either incomplete or non-scalable control of the magnetic order. Here, we demonstrate simple and functional ways of influencing the domain structure in CuMnAs and Mn2Au, two key materials of antiferromagnetic spintronics research, using device patterning and strain engineering. Comparing x-ray microscopy data from two different materials, we reveal the key parameters dictating domain formation in antiferromagnetic devices and show how the non-trivial interaction of magnetostriction, substrate clamping and edge anisotropy leads to specific equilibrium domain configurations. More specifically, we observe that patterned edges have a significant impact on the magnetic anisotropy and domain structure over long distances, and we propose a theoretical model that relates short-range edge anisotropy and long-range magnetoelastic interactions. The principles invoked are of general applicability to the domain formation and engineering in antiferromagnetic thin films at large, which will pave the way towards realizing truly functional antiferromagnetic devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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