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arXiv 2202.07408cond-mat.mtrl-sci
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晶体中表面与体扩散的耦合

Coupled surface and bulk diffusion in crystals

Sergey Kosolobov

AI总结:

本文提出晶体表面原子台阶同时作为体相点缺陷源汇的新机制,揭示体扩散通过次表面层与表面扩散耦合,并建立了体相与表面点缺陷平衡浓度之间的基本关系。

摘要:

我们分析了晶体-真空界面附近的点缺陷体扩散和表面扩散,并表明体扩散会受到表面-真空边界处原子反应的影响。本文提出了一种新的点缺陷产生与复合的原子机制。在该机制中,原子台阶不仅被视为吸附原子和表面空位的源与汇,而且也被视为体相本征点缺陷——空位和自间隙原子——的源与汇。我们证明,体扩散通过中间次表面层中的原子过程与表面上的吸附原子和表面空位扩散相耦合,该次表面层包含吸附的自间隙原子和体空位。结果表明,晶体体相与表面点缺陷的平衡浓度之间存在基本关系。

英文摘要:

We analyze point defect bulk and surface diffusion near the crystal-vacuum interface and show that bulk diffusion is altered by atomic reactions at the surface-vacuum boundary. A new atomic mechanism for point defect generation and recombination is presented. In this mechanism, atomic steps are considered as sources and sinks not only for adsorbed atoms and surface vacancies but also for bulk native point defects -- vacancies and self-interstitials. We demonstrate that bulk diffusion is coupled with the diffusion of adatoms and surface vacancies at the surface via the atomic processes in the intermediate subsurface layer, containing adsorbed self-interstitials and bulk vacancies. The results show the existence of the fundamental relation between equilibrium concentrations of the point defects in bulk and at the surface of the crystal.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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