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arXiv 0704.3218cond-mat.mtrl-sci
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有机半导体晶体中的体陷阱态密度:红荧烯中氧诱导的分立能级

Density of bulk trap states in organic semiconductor crystals: discrete levels induced by oxygen in rubrene

C. Krellner, S. Haas, C. Goldmann, K. P. Pernstich, D. J. Gundlach, B. Batlogg

摘要:

本文用变温空间电荷限制电流谱(TD-SCLC)的实验方法,对有机半导体单晶带隙中的陷阱态密度进行了高能量分辨率的定量测量。这种光谱已被应用于研究散装红荧烯单晶,这是由这种技术所示的高化学和结构质量。在最纯的晶体中测量到低至~ 10^{15} cm^{-3}的深陷阱态密度,并且可以识别带边附近指数变化的浅陷阱密度(每~25 meV的态密度为10)。此外,我们诱导和光谱确定了一个与氧有关的尖空穴体陷阱态在0.27 eV以上的价带。

英文摘要:

The density of trap states in the bandgap of semiconducting organic single crystals has been measured quantitatively and with high energy resolution by means of the experimental method of temperature-dependent space-charge-limited-current spectroscopy (TD-SCLC). This spectroscopy has been applied to study bulk rubrene single crystals, which are shown by this technique to be of high chemical and structural quality. A density of deep trap states as low as ~ 10^{15} cm^{-3} is measured in the purest crystals, and the exponentially varying shallow trap density near the band edge could be identified (1 decade in the density of states per ~25 meV). Furthermore, we have induced and spectroscopically identified an oxygen related sharp hole bulk trap state at 0.27 eV above the valence band.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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