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arXiv 0909.1200cond-mat.mtrl-sci
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CVD法生长金刚石单晶表面和体晶质量的控制

Control of surface and bulk crystalline quality in single crystal diamond grown by chemical vapour deposition

I. Friel, S. L. Clewes, H. K. Dhillon, N. Perkins, D. J. Twitchen, G. A. Scarsbrook

摘要:

为了改进基于通过化学气相沉积(CVD)生长的单晶金刚石的现有技术的性能,并且为了在诸如量子计算或固态和半导体盘状激光器的领域中开辟新技术,对表面和体晶体质量的控制是非常重要的。使用Ar/Cl气体混合物的电感耦合等离子体(ICP)蚀刻被证明可以去除机械加工表面的亚表面损伤,同时保持宏观平面度和微观尺度上的低粗糙度。高品质单晶CVD金刚石中的位错被证明是通过使用具有低表面损伤和低密度扩展缺陷的组合的衬底来减少的。衬底工程,使得只有少数的缺陷相交的外延表面也被示出导致位错密度的减少。本文报道了单晶CVD金刚石双折射的各向异性。超低双折射板(< 10-5)现在可用于固态盘状激光器的腔内散热器,并且应用不再受去偏振损耗的限制。沿垂直于CVD生长方向的方向小于5 × 10-7的BiNbO 3已在异常高质量的样品中得到证实。

英文摘要:

In order to improve the performance of existing technologies based on single crystal diamond grown by chemical vapour deposition (CVD), and to open up new technologies in fields such as quantum computing or solid state and semiconductor disc lasers, control over surface and bulk crystalline quality is of great importance. Inductively coupled plasma (ICP) etching using an Ar/Cl gas mixture is demonstrated to remove sub-surface damage of mechanically processed surfaces, whilst maintaining macroscopic planarity and low roughness on a microscopic scale. Dislocations in high quality single crystal CVD diamond are shown to be reduced by using substrates with a combination of low surface damage and low densities of extended defects. Substrates engineered such that only a minority of defects intersect the epitaxial surface are also shown to lead to a reduction in dislocation density. Anisotropy in the birefringence of single crystal CVD diamond due to the preferential direction of dislocation propagation is reported. Ultra low birefringence plates (< 10-5) are now available for intra-cavity heat spreaders in solid state disc lasers, and the application is no longer limited by depolarisation losses. Birefringence of less than 5*10-7 along a direction perpendicular to the CVD growth direction has been demonstrated in exceptionally high quality samples.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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