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arXiv 2109.05071cond-mat.mtrl-sci
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Y掺杂HfO2薄膜的本征铁电性

Intrinsic ferroelectricity in Y-doped HfO2 thin films

Yu Yun, Pratyush Buragohain, Ming Li, Zahra Ahmadi, Yizhi Zhang, Xin Li, Haohan Wang, Lingling Tao, Haiyan Wang, Jeffrey E. Shield, Evgeny Y. Tsymbal, Alexei Gruverman, Xiaoshan Xu

AI总结:

本研究在高结晶度的5% Y掺杂HfO2外延薄膜中实现了创纪录的50 μC/cm2室温自发极化,证实了其本征铁电性,为优化HfO2基材料性能开辟了新途径。

摘要:

铁电HfO2基材料因其在纳米尺度下稳健的铁电特性以及与现有Si技术的兼容性,在现代电子学中广泛集成铁电性方面具有巨大潜力。早期工作表明,纳米级晶粒尺寸对于稳定氧化铪的铁电相至关重要。这一限制导致HfO2基铁电体中存在高密度的不可避免的结构缺陷,掩盖了源自块体HfO2晶体空间群的本征铁电性。在此,我们展示了高结晶度Y掺杂HfO2薄膜中的本征铁电性。与普遍预期相反,我们发现在5% Y掺杂的HfO2外延薄膜中,高结晶度使得室温下的自发极化增强至创纪录的50 μC/cm2。这种高自发极化在低温下依然保持,极化值与我们的理论预测一致,表明本征铁电性的主导贡献。这些薄膜的晶体结构揭示了Pca21正交相并带有微小的三方畸变,凸显了各向异性应力与应变的作用。这些结果为控制HfO2基材料中的本征铁电性及优化其在应用中的性能开辟了途径。

英文摘要:

Ferroelectric HfO2-based materials hold great potential for widespread integration of ferroelectricity into modern electronics due to their robust ferroelectric properties at the nanoscale and compatibility with the existing Si technology. Earlier work indicated that the nanometer crystal grain size was crucial for stabilization of the ferroelectric phase of hafnia. This constraint caused high density of unavoidable structural defects of the HfO2-based ferroelectrics, obscuring the intrinsic ferroelectricity inherited from the crystal space group of bulk HfO2. Here, we demonstrate the intrinsic ferroelectricity in Y-doped HfO2 films of high crystallinity. Contrary to the common expectation, we show that in the 5% Y-doped HfO2 epitaxial thin films, high crystallinity enhances the spontaneous polarization up to a record-high 50 μC/cm2 value at room temperature. The high spontaneous polarization persists at reduced temperature, with polarization values consistent with our theoretical predictions, indicating the dominant contribution from the intrinsic ferroelectricity. The crystal structure of these films reveals the Pca21 orthorhombic phase with a small rhombohedral distortion, underlining the role of the anisotropic stress and strain. These results open a pathway to controlling the intrinsic ferroelectricity in the HfO2-based materials and optimizing their performance in applications.

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