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arXiv 2107.10074physics.plasm-ph
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电子鞘层理论及其在等离子体-表面相互作用中的应用

On the electron sheath theory and its applications in plasma-surface interaction

Guang-Yu Sun, Zhang Shu, An-Bang Sun, Guan-Jun Zhang

摘要:

电子鞘层是一种特殊的富电子鞘层,具有负净电荷,其中等离子体电位低于偏置电极。在这里,电子鞘理论的理解得到了改善,同时使用流体和动力学的方法,阐述其影响等离子体表面相互作用。首次提出了考虑电子鞘层结构的流体模型,避免了电子鞘层Child-Langmuir定律中的奇异性。后者被证明低估了鞘电位。随后,建立了电子鞘层的动力学模型,由于电子速度分布函数和有限的离子温度,相对于流体模型显示出相当不同的鞘层轮廓。该模型,然后进一步推广涉及更现实的截断离子速度分布函数。结果表明,这样的分布函数产生一个超热电子鞘层,其进入速度在鞘层边缘是大于所规定的玻姆准则,这意味着一个潜在的省略校准问题的探针测量。此外,试图将自洽的预鞘鞘匹配的动力学框架内,现实鞘入口和列入动力学效应之间的必要的妥协。最后,分析了电子鞘层中鞘层加速等离子体电子引起的次级电子发射,给出了鞘层电势与等离子体和壁面特性的耦合关系。

英文摘要:

The electron sheath is a particular electron-rich sheath with negative net charges where plasma potential is lower than the biased electrode. Here an improved understanding of electron sheath theory is provided using both fluid and kinetic approaches while elaborating on its implications for plasma-surface interaction. A fluid model is first proposed considering the electron presheath structure, avoiding the singularity in electron sheath Child-Langmuir law. The latter is proved to underestimate the sheath potential. Subsequently, the kinetic model of electron sheath is established, showing considerably different sheath profiles in respect to the fluid model due to the electron velocity distribution function and finite ion temperature. The model is then further generalized involving a more realistic truncated ion velocity distribution function. It is demonstrated that such distribution function yields a super-thermal electron sheath whose entering velocity at sheath edge is greater than that prescribed by the Bohm criterion, implying a potentially omitted calibration issue in the probe measurement. Furthermore, an attempt is made to incorporate the self-consistent presheath-sheath match within the kinetic framework, showing a necessary compromise between realistic sheath entrance and the inclusion of kinetic effects. In the end, the consequent secondary electron emission due to sheath-accelerated plasma electrons in electron sheath are analyzed, providing a sheath potential coupled with the plasma and wall properties.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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