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arXiv 1503.06530physics.plasm-ph
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微波鞘层-电压复合等离子体的时间行为

Temporal behavior of microwave sheath-voltage combination plasma

Satyananda Kar, Hiroyuki Kousaka, Laxminarayan L. Raja

摘要:

微波鞘层-电压组合等离子体(MVP)是高密度等离子体源,并且可以用作合适的等离子体处理装置(例如,离子化物理气相沉积)。在本报告中,氩MVP沿直流偏置钛棒持续的时间行为进行了研究。观察到两种等离子体模式,一种是“氧化态”(OS)在微波等离子体的早期,另一种是“电离溅射态”(ISS)在后期的时间。等离子体从OS到ISS的过渡导致等离子体的可见颜色的显著变化,这是由等离子体密度的显著增加引起的,如通过朗缪尔探针测量的。在OS中,等离子体以Ar离子为主,密度约为10^11 cm^-3。在ISS中,来自钛棒的金属离子对离子组成有很大贡献,并产生了更高密度的等离子体(10^12 cm^-3)。在非常低的输入微波功率(约30 W)下,沿钛棒长度产生几乎均匀的高密度等离子体。光学发射光谱测量证实了溅射Ti离子和Ti中性在ISS的存在。

英文摘要:

Microwave sheath-Voltage combination Plasma (MVP) is a high density plasma source and can be used as a suitable plasma processing device (e.g., ionized physical vapor deposition). In the present report, the temporal behavior of an argon MVP sustained along a direct-current biased Ti rod is investigated. Two plasma modes are observed, one is an "oxidized state" (OS) at the early time of the microwave plasma and the other is "ionized sputter state" (ISS) at the later times. Transition of the plasma from OS to ISS, results a prominent change in the visible color of the plasma, resulting from a significant increase in the plasma density, as measured by a Langmuir probe. In the OS, plasma is dominated by Ar ions and the density is order 10^11 cm^-3. In the ISS, metal ions from the Ti rod contribute significantly to the ion composition and higher density plasma (10^12 cm^-3) is produced. Nearly uniform high density plasma along the length of the Ti rod is produced at very low input microwave powers (around 30 W). Optical emission spectroscopy measurements confirm the presence of sputtered Ti ions and Ti neutrals in the ISS.

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