等离子体鞘层不稳定性引起的X波段微波产生
X-band microwave generation caused by plasma-sheath instability
摘要：
众所周知，由于浸没在等离子体中的正偏压电极附近的等离子体鞘层的不稳定性，可能出现电子等离子体频率的振荡。这种不稳定性是由电子通过鞘层时的渡越时间效应引起的。由于电极附近中性气体的额外电离，这种振荡表现为低功率短尖峰。在这里，我们提出的第一个结果时，得到的额外的电离消除。我们成功地延长了振荡在整个时间的正偏压施加到电极。这些振荡可以在比以前报道的高得多的频率（几十GHz与几百MHz相比）和几十mW的功率下获得。这些结果与所提出的理论估计相结合可能是有用的，例如，用于等离子体诊断
英文摘要：
It is well known that oscillations at the electron plasma frequency may appear due to instability of the plasma sheath near a positively biased electrode immersed in plasma. This instability is caused by transit-time effects when electrons, collected by this electrode, pass through the sheath. Such oscillations appear as low-power short spikes due to additional ionization of a neutral gas in the electrode vicinity. Herein we present first results obtained when the additional ionization was eliminated. We succeeded to prolong the oscillations during the whole time a positive bias was applied to the electrode. These oscillations could be obtained at much higher frequency than previously reported (tens of GHz compared to few hundreds of MHz) and power of tens of mW. These results in combination with presented theoretical estimations may be useful, e.g., for plasma diagnostics.
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