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arXiv 2102.00352cond-mat.mes-hallcond-mat.dis-nn
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拓扑绝缘体薄膜中的无序效应

Disorder effects in topological insulator thin films

Yi Huang, B. I. Shklovskii

摘要:

拓扑绝缘体(TI)的薄膜由于其表面间Dirac点的杂化效应而受到广泛关注。然而,这些效应可能会被大量库仑杂质的随机势对表面狄拉克点的意外大能量涂抹$Γ$所耗尽。我们表明,在一个典型的TI膜与大介电常数$\sim 50$夹在两个低介电常数层之间,Rytova-Chaplik-Entin-Keldysh修改的库仑电位的电荷杂质允许大量的膜杂质,以有助于$Γ$。结果,$Γ$大并且对于$d > 5$ nm与TI膜厚度$d$无关。在较薄的膜中,由于杂交间隙的屏蔽减少,$Γ$随着$d$的减少而生长。我们研究了远离中性点和中性点处的表面电导率。在后一种情况下,我们发现的最大TI膜厚度的杂交间隙仍然能够使TI膜绝缘,并允许观察的量子自旋霍尔效应,$d_{\max} \sim 7$ nm。

英文摘要:

Thin films of topological insulators (TI) attract large attention because of expected topological effects from the inter-surface hybridization of Dirac points. However, these effects may be depleted by unexpectedly large energy smearing $Γ$ of surface Dirac points by the random potential of abundant Coulomb impurities. We show that in a typical TI film with large dielectric constant $\sim 50$ sandwiched between two low dielectric constant layers, the Rytova-Chaplik-Entin-Keldysh modification of the Coulomb potential of a charge impurity allows a larger number of the film impurities to contribute to $Γ$. As a result, $Γ$ is large and independent of the TI film thickness $d$ for $d > 5$ nm. In thinner films $Γ$ grows with decreasing $d$ due to reduction of screening by the hybridization gap. We study the surface conductivity away from the neutrality point and at the neutrality point. In the latter case, we find the maximum TI film thickness at which the hybridization gap is still able to make a TI film insulating and allow observation of the quantum spin Hall effect, $d_{\max} \sim 7$ nm.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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