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arXiv 1012.5716cond-mat.mes-hall
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在绝缘衬底上生长拓扑绝缘体Bi2Se3量子阱薄膜

Growth of quantum well films of topological insulator Bi2Se3 on insulating substrate

Cui-Zu Chang, Ke He, Min-Hao Liu, Zuo-Cheng Zhang, Xi Chen, Li-Li Wang, Xu-Cun Ma, Ya-Yu Wang, Qi-Kun Xue

摘要:

绝缘衬底对于厚度仅为几纳米的拓扑绝缘体薄膜的电输运研究和室温应用至关重要。采用分子束外延技术在α-Al 2 O3(蓝宝石)(0001)衬底上生长了高质量的三维拓扑绝缘体Bi 2Se 3量子阱薄膜。薄膜具有良好的量子阱态和表面态,表明宏观区域的厚度均匀。蓝宝石(0001)衬底上的Bi_2Se_3薄膜为研究拓扑绝缘体的低维物理提供了一个很好的系统,因为衬底的导电贡献很小,可以忽略不计。

英文摘要:

Insulating substrates are crucial for electrical transport study and room temperature application of topological insulator films at thickness of only several nanometers. High quality quantum well films of Bi2Se3, a typical three-dimensional topological insulator, have been grown on α-Al2O3 (sapphire) (0001) by molecular beam epitaxy. The films exhibit well-defined quantum well states and surface states, suggesting the uniform thickness over macroscopic area. The Bi2Se3 thin films on sapphire (0001) provide a good system to study low-dimensional physics of topological insulators since conduction contribution from the substrate is negligibly small.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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