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arXiv 2009.07582cond-mat.mes-hall
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石墨烯场效应晶体管灵敏度的实验设计分析

Sensitivity Analysis of a Graphene Field-Effect Transistors by means of Design of Experiments

Giovanni Spinelli, Patrizia Lamberti, Vincenzo Tucci, Francisco Pasadas, David Jiménez

摘要:

石墨烯由于其独特的电子结构有利于高载流子迁移率,被认为是后硅电子时代用于高速电子器件的有前途的材料。出于这个原因,石墨烯基场效应晶体管(GFET)的实验研究在过去几年中迅速增加。然而,尽管在这些装置的优化方面不断取得进展,但仍有许多关键问题有待解决,例如它们的再现性和性能均匀性,以及制造工艺或操作条件引起的可能变化。在目前的工作中,变化的ID-VDS特性的石墨烯场效应晶体管,所造成的公差为10%的有源沟道(即其长度和宽度)和顶部氧化层厚度的数值研究,以评估这种设备的可靠性。实验设计(DoE)的目的是通过确定最有影响力的因素对器件的电气性能,使制造工艺可以适当地优化。

英文摘要:

Graphene, due to its unique electronic structure favoring high carrier mobility, is considered a promising material for use in high-speed electronic devices in the post-silicon electronic era. For this reason, experimental research on graphene-based field-effect transistors (GFETs) has rapidly increased in the last years. However, despite the continuous progress in the optimization of such devices many critical issues remain to be solved such as their reproducibility and performance uniformity against possible variations originated by the manufacturing processes or the operating conditions. In the present work, changes of the ID-VDS characteristics of a Graphene Field-Effect Transistors, caused by a tolerance of 10% in the active channel (i.e. its length and width) and in the top oxide thickness are numerically investigated in order to assess the reliability of such devices. Design of Experiments (DoE) is adopted with the aim to identify the most influential factors on the electrical performance of the device, so that the fabrication process may be suitably optimized.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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