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arXiv 2009.04714cond-mat.mtrl-sci
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控制HfO2-based铁电体唤醒效应的缺陷工程

Defect engineering for control of wake-up effect in HfO2-based ferroelectrics

Alireza Kashir, Seungyeol Oh, Hyunsang Hwang

摘要:

唤醒效应一直是阻碍氧化硅基铁电薄膜商业化的一个障碍。在这项工作中,我们调查的缺陷,控制臭氧剂量,对原子层沉积的Hf0.5Zr0.5O2(HZO)薄膜的场循环行为的影响。在通过增加臭氧剂量减少碳污染和氧缺陷后,实现了几乎无唤醒的器件。在30秒的臭氧脉冲持续时间下生长的样品在原始状态下显示出约98%的唤醒Pr,而在5秒的臭氧脉冲时间以下生长的样品显示出收缩的滞后回线,经历了大的唤醒效应。X射线光电子能谱学(XPS)分析结果表明,在氧含量不足的情况下,薄膜中的氧空位和碳浓度增加是导致薄膜中氧空位和碳浓度增加的主要原因。X射线衍射(XRD)扫描表明,臭氧脉冲时间的增加导致四方相的减少,因此介电常数降低。I-V测试结果表明,随着臭氧用量的减少,电流密度增加,这可能是由于沉积膜中氧空位的产生。最后,我们研究了唤醒效应的动力学,它似乎是很好地解释了基于结构相变的Johnson-Mehl-Avrami-Kolmogoroff模型。

英文摘要:

Wake-up effect is still an obstacle in the commercialization of hafnia-based ferroelectric thin films. In this work, we investigate the effect of defects, controlled by ozone dosage, on the field cycling behavior of the atomic layer deposited Hf0.5Zr0.5O2 (HZO) films. A nearly wake-up free device was achieved after reduction of carbon contamination and oxygen defects by increasing the ozone dosage. The sample which was grown at 30 sec ozone pulse duration shows about 98% of the woken-up Pr at the pristine state while those grown below 5 sec ozone pulse time show a pinched hysteresis loop, undergone a large wake-up effect. This behavior is attributed to the increase in oxygen vacancy and carbon concentration in the films deposited at insufficient O3 dosage which was confirmed by x-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) scan shows that the increase of ozone pulse time yields in the reduction of tetragonal phase; therefore, the dielectric constant reduces. The I-V measurements reveal the increase of current density as the ozone dosage decreases which might be due to the generation of oxygen vacancies in the deposited film. Finally, we have investigated the dynamics of wake-up effect and it appears to be explained well by Johnson-Mehl-Avrami-Kolmogoroff model which is based on structural phase transformation.

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