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arXiv 2005.13863physics.app-ph
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深低温下40 nm MOSFET的量子输运

Quantum Transport in 40-nm MOSFETs at Deep-Cryogenic Temperatures

Tsung-Yeh Yang, Andrea Ruffino, John Michniewicz, Yatao Peng, Edoardo Charbon, M. Fernando Gonzalez-Zalba

摘要:

在这封信中,我们的特点是商业散装40纳米MOSFET在室温和深低温下的电性能,重点是量子信息处理(QIP)的应用。在50 mK时,当分别施加高或低漏极偏压时,器件作为经典FET或量子点器件工作。在300 K时,经典区的工作表现出较好的介电常数和亚阈斜率.在量子区,所有测量的器件都表现出库仑阻塞。这是由量子点在通道中的形成,提出了一个模型来解释。参数的变化,重要的量子计算缩放,也被量化。我们的研究结果表明,体40 nm节点MOSFET可以很容易地用于低温CMOS经典量子线路在深低温的共集成,并且可变性接近均匀性要求,使共享控制。

英文摘要:

In this letter, we characterize the electrical properties of commercial bulk 40-nm MOSFETs at room and deep cryogenic temperatures, with a focus on quantum information processing (QIP) applications. At 50 mK, the devices operate as classical FETs or quantum dot devices when either a high or low drain bias is applied, respectively. The operation in classical regime shows improved transconductance and subthreshold slope with respect to 300 K. In the quantum regime, all measured devices show Coulomb blockade. This is explained by the formation of quantum dots in the channel, for which a model is proposed. The variability in parameters, important for quantum computing scaling, is also quantified. Our results show that bulk 40-nm node MOSFETs can be readily used for the co-integration of cryo-CMOS classical-quantum circuits at deep cryogenic temperatures and that the variability approaches the uniformity requirements to enable shared control.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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