arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2005.11834cond-mat.mtrl-scicond-mat.mes-hall
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拓扑材料中的线性响应

Linear Response in Topological Materials

Jonathan Noky, Yan Sun

摘要:

拓扑绝缘体和半金属的发现为人们理解材料开辟了新的视角。拓扑材料由于特殊的能带结构和增大的Berry曲率,使得线性响应得到了很大的增强。拓扑能带结构和对称性的相互作用对于设计具有强的和奇异的新电磁响应的新材料起着至关重要的作用,并且为下一代技术应用提供了有前途的机制和新材料。我们从对称性的角度回顾了拓扑材料中线性响应的基本概念,并讨论了它们的潜在应用。

英文摘要:

The discovery of topological insulators and semimetals has opened up a new perspective to understand materials. Owing to the special band structure and enlarged Berry curvature, the linear responses are strongly enhanced in topological materials. The interplay of topological band structure and symmetries plays a crucial role for designing new materials with strong and exotic new electromagnetic responses and provides promising mechanisms and new materials for the next generation of technological applications. We review the fundamental concept of linear responses in topological materials from the symmetry point of view and discuss their potential applications.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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