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arXiv 2004.13854cond-mat.mtrl-sci
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Temperature-Dependent Resistivity of Alternative Metal Thin Films

Marco Siniscalchi, Davide Tierno, Kristof Moors, Zsolt Tokei, Christoph Adelmann

英文摘要:

The temperature coefficients of the resistivity (TCR) of Cu, Ru, Co, Ir, and W thin films have been investigated as a function of film thickness below 10 nm. Ru, Co, and Ir show bulk-like TCR values that are rather independent of the thickness whereas the TCR of Cu increases strongly with decreasing thickness. Thin W films show negative TCR values, which can be linked to high disorder. The results are qualitatively consistent with a temperature-dependent semiclassical thin film resistivity model that takes into account phonon, surface, and grain boundary scattering.

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