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arXiv 1810.08232cond-mat.mtrl-sci
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Mn $_{1.5}$ PtSn薄膜的拓扑霍尔效应

Topological Hall effect in thin films of Mn$_{1.5}$PtSn

Peter Swekis, Anastasios Markou, Dominik Kriegner, Jacob Gayles, Richard Schlitz, Walter Schnelle, Sebastian T. B. Goennenwein, Claudia Felser

摘要:

非共面磁序金属材料中的自旋手征可以引起Berry相诱导的拓扑霍尔效应。在这里,我们报告了一个大的拓扑霍尔效应在高品质的Mn $_{1.5}$ PtSn薄膜,通过磁控溅射MgO(001)上生长的观察。拓扑霍尔电阻率高达低于自旋重取向转变温度$T_{s}=185$ ~K的$μ_{0}H \approx 4~$ T。我们发现,最大的拓扑霍尔电阻率是可比的大小异常霍尔电阻率。由于尺寸,拓扑霍尔效应在通常执行的磁力测量数据的减法之前直接明显。此外,我们强调了Mn \textsubscript{2-x} PtSn中拓扑霍尔效应的鲁棒性,通过提取多个化学计量比(x~=~0.5,0.25,0.1)和膜厚度(t = 104,52,35~nm)的效应,其中在150~K下最大拓扑霍尔系数在$0.76~μΩ$ cm和$1.55~μΩ$ cm之间。

英文摘要:

Spin chirality in metallic materials with non-coplanar magnetic order can give rise to a Berry phase induced topological Hall effect. Here, we report the observation of a large topological Hall effect in high-quality films of Mn$_{1.5}$PtSn that were grown by means of magnetron sputtering on MgO(001). The topological Hall resistivity is present up to $μ_{0}H \approx 4~$T below the spin reorientation transition temperature, $T_{s}=185$~K. We find, that the maximum topological Hall resistivity is of comparable magnitude as the anomalous Hall resistivity. Owing to the size, the topological Hall effect is directly evident prior to the customarily performed subtraction of magnetometry data. Further, we underline the robustness of the topological Hall effect in Mn\textsubscript{2-x}PtSn by extracting the effect for multiple stoichiometries (x~=~0.5, 0.25, 0.1) and film thicknesses (t = 104, 52, 35~nm) with maximum topological Hall resistivities between $0.76~μΩ$cm and $1.55~μΩ$cm at 150~K.

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