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arXiv 1908.09273cond-mat.mtrl-sci
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Direct Patterning of Boron-doped Amorphous Carbon Using Focused Ion Beam-assisted Chemical Vapor Deposition

Ryo Matsumoto, El Hadi S. Sadki, Hiromi Tanaka, Sayaka Yamamoto, Shintaro Adachi, Hiroyuki Takeya, Yoshihiko Takano

英文摘要:

The deposition of boron-doped amorphous carbon thin films on SiO2 substrate was achieved via a focused ion beam-assisted chemical vapor deposition of triphenyl borane (C18H15B) and triphenyl borate (C18H15BO3). The existence of boron in the deposited film from triphenyl borane, with a precursor temperature of 90 °C, was confirmed by a core level X-ray photoelectron spectroscopy analysis. The film exhibited a semiconducting behavior with a band gap of 285 meV. Although the band gap was decreased to 197 meV after an annealing process, the film was still semiconductor. Additionally, a drastic reduction of the resistance on the deposited film by applying pressures was observed from an in-situ electrical transport measurements using a diamond anvil cell.

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