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arXiv cond-mat/0103478cond-mat.supr-concond-mat.mtrl-sci
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脉冲laser淀积原位退火法生长Tc \approx 24 K的二硼化镁超导薄膜

Superconducting magnesium diboride films with Tc \approx 24K grown by pulsed laser deposition with in-situ anneal

H. M. Christen, H. Y. Zhai, C. Cantoni, M. Paranthaman, B. C. Sales, C. Rouleau, D. P. Norton, D. K. Christen, D. H. Lowndes, .

摘要:

用脉冲激光沉积(PLD)法在不同氧化物衬底上制备了Tc为\approx 24 K的二硼化镁(MgB 2)超导薄膜,并进行了原位退火。系统地研究了各种原位退火参数的影响,结果表明,在0.7大气压的背景下,最佳退火温度约为600 ℃。对于由镁和硼的混合物组成的层,Ar/4%H2。与非原位方法(例如,使硼膜与镁蒸气在900 ℃下反应)相反,这些膜在低于MgB 2的分解温度下处理。这可能证明使在形成多层,结,和外延膜在未来的工作。这些薄膜的改进和MgB 2在高温下可能的原位生长有关的问题进行了讨论。

英文摘要:

Thin superconducting films of magnesium diboride (MgB2) with Tc \approx 24K were prepared on various oxide substrates by pulsed laser deposition (PLD) followed by an in-situ anneal. A systematic study of the influence of various in-situ annealing parameters shows an optimum temperature of about 600C in a background of 0.7 atm. of Ar/4%H2 for layers consisting of a mixture of magnesium and boron. Contrary to ex-situ approaches (e.g. reacting boron films with magnesium vapor at 900C), these films are processed below the decomposition temperature of MgB2. This may prove enabling in the formation of multilayers, junctions, and epitaxial films in future work. Issues related to the improvement of these films and to the possible in-situ growth of MgB2 at elevated temperature are discussed.

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