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arXiv 1906.09402physics.plasm-ph
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高功率快脉冲磁控放电

High power fast pulsed magnetron discharges

Mihai Ganciu

摘要:

为了提高磁控放电沉积薄膜的质量,特别是有效地电离溅射气体,我们开发了一种基于微秒级脉冲磁控放电预电离的电离物理气相沉积方法(1-50微秒)导致较低的击穿延迟,脉冲磁控管电流的短下降时间,低于1微秒,高的离子/中性流率比,无电弧区和良好的稳定性,具有非常大的瞬时功率。过渡到自溅射区,反应操作模式和离子输运到衬底可以通过电流脉冲的形状和持续时间调制。获得了高阴极电流密度(1-20 A/cm 2),并证明了大压力范围操作(3-300 mTorr)。

英文摘要:

In order to improve the quality of thin film deposition by magnetron discharges, particularly by an effective ionization of the sputtered vapor, we developed an ionized physical vapor deposition method based on pre-ionized pulsed magnetron discharges operating in microsecond range (1-50 microseconds) leading to a lower breakdown delay, short fall time of the pulsed magnetron current, lower than one microsecond, a high ion-to-neutral flux ratio at the substrate, an arc free regime and good stability with very large instantaneously power.The transition to the self-sputtering regime, the reactive operation mode and the ion transport to the substrate can be modulated by the current pulse shape and duration. High cathode current densities (1-20 A/cm2) are obtained and large pressure range operation (3-300 mTorr) is demonstrated.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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