arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1802.01043physics.app-phcond-mat.mes-hallcond-mat.mtrl-sci
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自对准范德华异质结二极管和晶体管

Self-Aligned van der Waals Heterojunction Diodes and Transistors

Vinod K. Sangwan, Megan E. Beck, Alex Henning, Jiajia Luo, Hadallia Bergeron, Junmo Kang, Itamar Balla, Hadass Inbar, Lincoln J. Lauhon, Mark C. Hersam

摘要:

一般的自对准制造方案在这里报道了不同类别的电子器件的基础上范德华材料和异质结。特别地,自对准使得能够在单层MoS 2中制造具有接近理想的电流饱和特性和低至135 nm的沟道长度的源极-栅极晶体管。此外,自对准的范德华p-n异质结二极管实现了完全的静电控制的p型和n型组成半导体在一个双栅极的几何形状,在栅极可调的平均值和方差的反双极高斯特性。通过有限元器件模拟,阐明了源极-栅极晶体管和双栅极反双极器件的工作原理,从而为采用自对准几何结构的其他器件提供了设计规则。例如,通过接触掺杂的二硫化钼同质结二极管和基于有机半导体的混合维异质结证明了该方案的多功能性。这种方法的可扩展性也显示通过制造自对准短沟道晶体管的子衍射沟道长度在150 nm至800 nm的范围内,使用光刻的化学气相沉积生长的大面积二硫化钼膜。总的来说,这种自对准制造方法代表了将范德华异质结器件可扩展地集成到更复杂的电路和系统中的重要一步。

英文摘要:

A general self-aligned fabrication scheme is reported here for a diverse class of electronic devices based on van der Waals materials and heterojunctions. In particular, self-alignment enables the fabrication of source-gated transistors in monolayer MoS2 with near-ideal current saturation characteristics and channel lengths down to 135 nm. Furthermore, self-alignment of van der Waals p-n heterojunction diodes achieves complete electrostatic control of both the p-type and n-type constituent semiconductors in a dual-gated geometry, resulting in gate-tunable mean and variance of anti-ambipolar Gaussian characteristics. Through finite-element device simulations, the operating principles of source-gated transistors and dual-gated anti-ambipolar devices are elucidated, thus providing design rules for additional devices that employ self-aligned geometries. For example, the versatility of this scheme is demonstrated via contact-doped MoS2 homojunction diodes and mixed-dimensional heterojunctions based on organic semiconductors. The scalability of this approach is also shown by fabricating self-aligned short-channel transistors with sub-diffraction channel lengths in the range of 150 nm to 800 nm using photolithography on large-area MoS2 films grown by chemical vapor deposition. Overall, this self-aligned fabrication method represents an important step towards the scalable integration of van der Waals heterojunction devices into more sophisticated circuits and systems.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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