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arXiv 1702.04535cond-mat.mes-hallcond-mat.mtrl-sci
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过渡金属二硫族化合物中依赖于层数的电子结构变化——微观起源

Layer dependent electronic structure changes in transition metal dichalcogenides- The microscopic origin

S. K. Pandey, Ruma Das, Priya Mahadevan

AI总结:

本研究针对过渡金属二硫族化合物带隙随厚度变化与范德华作用主导的矛盾,通过紧束缚模型量化分析,证实其电子结构变化仅由层间跃迁相互作用主导,马德隆势相关效应可忽略。

摘要:

我们研究了过渡金属二硫族化合物MX₂(其中M=Mo、W,X=S、Se和Te)的电子结构演化。这类材料一方面通常被归为范德华异质结,但在某些情况下,其带隙随厚度的变化幅度可达0.6 eV,这与主导相互作用为范德华相互作用的描述似乎并不一致。通过映射到紧束缚模型,我们得以量化电子结构的变化,发现这些变化完全由层间跃迁相互作用决定。原子所处的不同环境可能会改变马德隆势,进而改变在位能,这种情况既可能发生在从单层到双层的转变过程中,也可能出现在堆叠方式不同于2H结构的情形中。定量分析发现这些效应可以忽略不计,从而我们得以证实,依赖于厚度的电子结构变化仅源于层间相互作用。

英文摘要:

We have examined the electronic structure evolution in transition metal dichalcogenides MX$_2$, where M=Mo,W and X=S,Se and Te. These are generally referred to as van der Waals heterostructures on the one hand, yet one has band gap changes as large as 0.6 eV with thickness in some instances. This does not seem to be consistent with a description where the dominant interactions are van der Waals interactions. Mapping onto a tight binding model allows us to quantify the electronic structure changes which are found to be dictated solely by interlayer hopping interactions. Different environments that an atom encounters could change the Madelung potential and therefore the onsite energies. This could happen while going from monolayer to bilayer as well as in cases where the stackings are different from what is found in 2H structures. These effects are quantitatively found to be negligible, enabling us to quantify the thickness dependent electronic structure changes as arising from interlayer interactions alone.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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