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arXiv 1609.00542cond-mat.mtrl-sci
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GeSn外延层的光致发光温度特性

Temperature-dependent photoluminescence characteristics of GeSn epitaxial layers

Fabio Pezzoli, Anna Giorgioni, David Patchett, Maksym Myronov

摘要:

GeSn外延异质结构正在成为在Si衬底上单片集成光源的突出候选者。在这里,我们提出了一个明智的解释,其温度依赖性的光致发光(PL)的基础上,迄今为止被忽视的光学活动的位错。通过在塑性弛豫的开始,每当外延层释放在晶格失配的衬底上生长过程中积累的应变时发生,我们证明了位错成核可以明确地看到在PL数据。值得注意的是,我们的研究结果指出,单调的热PL淬灭可以观察到在相干薄膜,尽管GeSn带隙的间接性质。因此,我们的研究有助于更深入地了解这种有趣的IV族合金中的复合动力学,并提供了对塑造发光效率的关键现象的见解。

英文摘要:

GeSn epitaxial heterostructures are emerging as prominent candidates for the monolithic integration of light sources on Si substrates. Here we propose a judicious explanation for their temperature-dependent photoluminescence (PL) that is based upon the so far disregarded optical activity of dislocations. By working at the onset of plastic relaxation, which occurs whenever the epilayer releases the strain accumulated during growth on the lattice mismatched substrate, we demonstrate that dislocation nucleation can be explicitly seen in the PL data. Notably, our findings point out that a monotonous thermal PL quenching can be observed in coherent films, in spite of the indirect nature of the GeSn bandgap. Our investigation, therefore, contributes to a deeper understanding of the recombination dynamics in this intriguing group IV alloy and offers insights into crucial phenomena shaping the light emission efficiency.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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