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arXiv 1602.02112cond-mat.mtrl-sci
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稀相GaAs_{1-x} Bi_x合金带隙变窄和局域化的组态依赖性

Configuration Dependence of Band Gap Narrowing and Localization in Dilute GaAs_{1-x} Bi_x Alloys

Lars C. Bannow, Oleg Rubel, Phil Rosenow, Stefan C. Badescu, Jorg Hader, Jerome V. Moloney, Ralf Tonner, Stephan W. Koch

摘要:

在III-V族半导体中用铋(Bi)进行阴离子取代是在低Bi浓度下,特别是在砷化镓(GaAs)中进行带隙Eg的实验工程的有效方法。在低浓度x下,Eg与Bi浓度的反相关性是线性的,并且由As和Bi占据的p能级之间的价带-缺陷能级反交叉决定.这种依赖性在高浓度下分解,其中仅考虑As-Bi相互作用的经验模型不适用。预测模型的价带杂化需要一个第一原理的理解,可以通过密度泛函理论获得的主要挑战是适当的描述Eg和自旋轨道耦合。通过使用一种有效的方法,包括这些影响,它在这里示出,在高浓度下,Eg主要是由一个Bi-Bi p轨道相互作用和由大Bi原子引起的应变修改。这表明了通过改变实验生长条件获得的不同原子构型在工程砷化物带隙中的作用,特别是在电信激光技术中。

英文摘要:

Anion substitution with bismuth (Bi) in III-V semiconductors is an effective method for experimental engineering of the band gap Eg at low Bi concentrations, in particular in gallium arsenide (GaAs). The inverse Bi-concentration dependence of Eg has been found to be linear at low concentrations x and dominated by a valence band-defect level anticrossing between As and Bi occupied p levels. This dependence breaks down at high concentrations where empirical models accounting only for the As-Bi interaction are not applicable. Predictive models for the valence band hybridization require a first-principle understanding which can be obtained by density functional theory with the main challenges being the proper description of Eg and the spin-orbit coupling. By using an efficient method to include these effects, it is shown here that at high concentrations Eg is modified mainly by a Bi-Bi p orbital interaction and by the large Bi atom-induced strain. This points to the role of different atomic configurations obtained by varying the experimental growth conditions in engineering arsenide band gaps, in particular for telecommunication laser technology.

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